LOFT中国感谢来自 修迪建筑设计（SUD Architectes） 的建筑改造案例分享：
一．项目简介PROJECT BRIEF
建筑外立面设计的翻新改造, 其中65000平方米是办公室, 45300平方米是工业园区。
Architectural refurbishment with design of the facades, including 65000 sqm of offices, and 45300 sqm of industrial park.
二. 项目设计介绍PROJECT DESIGN INTRODUCTION
知微见著 Micro-state in a macro-scale
我们的设计目标是将SMIC PMD 外观方案抽象地体现SMIC的产品，立面图的设计理念基于将半导体晶圆的微观视角传达到建筑物的宏观形象，该方案的灵感来源于芯片光刻图形，而宏观与微观的巧妙结合也可以使我们的客户自然联想到半导体行业。
Design intent is to create an external envelope for SMIC office building as an abstract representation of SMIC MANUFACTURED PRODUCT. Front façade is based on the idea to transform the semiconduction wafer’s micro-scale appearance to the macro-scale building appearance. The pattern is inspired by the characteristics of photoresist pattern on the semiconductor industry.
自然、艺术、科技 Nature, art and technology
透过外观多样的竖向线条，既可凸显建筑物的轮廓又享受休闲区域的绿化，而线条的质感呈现公司对产品的严谨态度和工程思维，也表达了SMIC人打造产品时秉承精细、艺术的工作准则，也是自然、艺术与科技的完美结合。
Through the diverse density of its vertical mullions, the volume of the building and green leisure areas are emphasized. Mullions can also express the rigorous, engineering meaning of the products made by the company and the subtle, artistic side of the people who are responsible for their creation.
可持续性 Sustainability
本设计同时遵循可持续发展的原则，在不影响办公室的视域的前提下，减少西面的阳光照射及热负荷，我们知道西立面是光照最强也是办公室利用最充分的一面，此处考虑外部竖向遮阳百叶可以有效减少阳光直射从而达到节能的目的。
Following sustainable development principles, another major goal is to reduce heat impact on the west façade while not obstructing the view from office units. As the main elevation is both most sun exposed and most office used, the proposed external vertical louvers system would reduce the heat accumulated in the building.
∇ 立面图 elevations
完整项目信息
项目名称: 中芯国际立面改造 | SMIC Façade Renovation
业主：中芯国际集成电路制造有限公司
建筑事务所: SUD Architectes 修迪建筑设计
事务所网站: www.sudarchitectes.com
电邮联系方式: llin@sudarchitectes.com
主创建筑师: Jocelyn FILLARD; Wojciech Młynarczyk; Bruno SOUSA; Arnaud ROSSOCELO;
设计团队：SUD Architectes
项目详细地址: 上海浦东
项目完成年份: 2018年已交付
建筑面积: 110300平方米
摄影师：SUD Architectes China
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